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Moiré Analysis
Moiré
thermal pattern imaging is generated by illuminating standard thinned and
polished silicon from the backside with a monochromatic laser 'flood' source
(illuminating between 1064nm and 1400nm). Laser
flood illumination is key to implementation of Moiré imaging, since local
heating is negligible, due to the low intensity. Typical high power laser scan techniques
are not applicable due to their excessive beam intensity and resultant local
heating effects.
Moiré Analysis is enabled with the use of the ULTRASPEC-III Laser Illuminator and the Thermal Controller
This technique was the subject of a recent technical paper, presented at IPFA 2005. Please click here for a copy of the paper.
Please contact us to find out how Moiré thermal and our other techniques can help in your application
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